If a semiconductor has an intrinsic carrier concentration of $1.41 \times 10^{16} \, m^{-3}$,when doped with $10^{21} \, m^{-3}$ phosphorus,then the concentration of holes at room temperature will be

  • A
    $2 \times 10^{21} \, m^{-3}$
  • B
    $1.41 \times 10^{16} \, m^{-3}$
  • C
    $1.41 \times 10^{10} \, m^{-3}$
  • D
    $2 \times 10^{11} \, m^{-3}$

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$A$ silicon specimen is made into a $P$-type semiconductor by doping,on an average,one Indium atom per $5 \times 10^7$ silicon atoms. If the number density of atoms in the silicon specimen is $5 \times 10^{28} \text{ atoms}/m^3$,then the number of acceptor atoms in silicon per cubic centimetre will be:

For a pure $Si$ crystal at $300 \ K$,the electron $(n_e)$ and hole $(n_h)$ concentrations are equal,being $1.5 \times 10^{16} \ m^{-3}$. On doping with Indium,the hole concentration increases to $4.5 \times 10^{22} \ m^{-3}$. Calculate the new electron concentration $(n_e)$ in the doped $Si$.

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