The most commonly used material for making transistors is

In a $p$-type semiconductor,

When $Ge$ crystals are doped with phosphorus atoms,then it becomes

Suppose an $n$-type wafer is created by doping $Si$ crystal having $5 \times 10^{28} \text{ atoms/m}^3$ with $1 \text{ ppm}$ concentration of $As$. On the surface,$200 \text{ ppm}$ Boron is added to create a $p$-region in this wafer. Considering $n_i = 1.5 \times 10^{16} \text{ m}^{-3}$,$(i)$ Calculate the densities of the charge carriers in the $n$ and $p$ regions. $(ii)$ Comment on which charge carriers would contribute largely to the reverse saturation current when the diode is reverse biased.

What will be the conductivity of a pure silicon crystal at $300 \ K$ temperature,if the electron-hole pairs per $cm^3$ is $1.072 \times 10^{10}$ at this temperature,$\mu_e = 1350 \ cm^2/V \cdot s$ and $\mu_h = 480 \ cm^2/V \cdot s$?

In an intrinsic semiconductor,the energy gap $E_{g}$ is $1.2 \; eV$. Its hole mobility is much smaller than electron mobility and independent of temperature. What is the ratio between conductivity at $600 \; K$ and that at $300 \; K$? Assume that the temperature dependence of intrinsic carrier concentration $n_{i}$ is given by $n_{i} = n_{0} \exp \left(-\frac{E_{g}}{2 k_{B} T}\right)$,where $n_{0}$ is a constant.