The impurity atoms which are mixed with pure silicon to make a $P$-type semiconductor are those of:

The electron mobility in $N$-type germanium is $3900 \ cm^2/V \cdot s$ and its conductivity is $6.24 \ mho/cm$. If the effect of holes is negligible,what is the impurity concentration?

$A$ semiconductor is doped with phosphorous atoms as an impurity. The impurity levels created in the semiconductor are close to the

$A$ semiconductor doped with a donor impurity is

$A$ potential difference of $2\,V$ is applied between the opposite faces of a $Ge$ crystal plate of area $1\,cm^{2}$ and thickness $0.5\,mm$. If the concentration of electrons in $Ge$ is $2 \times 10^{19}/m^{3}$ and mobilities of electrons and holes are $0.36\,m^{2}/(V\cdot s)$ and $0.14\,m^{2}/(V\cdot s)$ respectively,then the current flowing through the plate will be... (in $,A$)

In an $n-$type semiconductor,which of the following statements is true?