Doping of intrinsic semiconductor is done:

  • A
    To neutralize charge carriers
  • B
    To increase the concentration of majority charge carriers
  • C
    To make it neutral before disposal
  • D
    To carry out further purification

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Similar Questions

Pure $Si$ at $500\, K$ has equal number of electron $(n_e)$ and hole $(n_h)$ concentrations of $1.5 \times 10^{16} \, m^{-3}$. Doping by indium increases $n_h$ to $4.5 \times 10^{22} \, m^{-3}$. The doped semiconductor is of:

When the temperature of a semiconductor increases,then:

The mobility of free electrons is greater than that of free holes because

When an $N-$type semiconductor is heated,what happens to the charge carriers?

The hole and the free electron concentrations in a pure silicon at room temperature are given by $1.4 \times 10^{16} \ m^{-3}$ each under equilibrium. When it is doped with indium and the hole concentration is $n_{h} = 4 \times 10^{22} \ m^{-3}$,the electron concentration is

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